Previous Article Next Article Table of Contents Journal of Materials Science, Vol.39, No.9, 3203-3205, 2004 DOI10.1023/B:JMSC.0000025860.31547.e5 Export Citation Formation of C54TiSi(2) thin films by using high-temperature sputtering and rapid thermal annealing Lee SJ, Kim DY, Kim TW Please enable JavaScript to view the comments powered by Disqus.
