Critical issues of electrophoretic deposition (EPD) and its potential for fabricating high-performance ceramics are reviewed. Deposition kinetics under constant-current and constant-voltage conditions are discussed. The process of submonolayer formation of mono-sized silica particles as a function of deposition time during EPD has been discussed and is shown to have a remarkable similarity with the atomic thin-film growth (10000 times smaller scale) process of Molecular Beam Epitaxial (MBE) process. Ceramic coatings by EPD are described and strategies to avoid cracking are outlined. Discussion on avoiding cracking using the Reaction Bonded Aluminium Oxide (RBAO) process is also described. The versatility of the EPD process towards fabrication of a wide spectrum of composite microstructures is discussed together with references. Potential use of EPD in the fabrication of Micro-Solid Oxide Fuel Cell (muSOFC) has also been discussed. (C) 2004 Kluwer Academic Publishers.