Journal of Vacuum Science & Technology B, Vol.22, No.1, 27-30, 2004
Fluoropolymers for 157 nm single-layer resists
Tetrafluoroethylene-based copolymers with functionalized norbornenes were synthesized using a hydrocarbon and hydrofluorocarbon initiators and their fundamental properties, such as transparency at 157 nm and solubility in a standard alkaline developer were characterized. A high transparency, i.e., absorbance of less than 0.5 mum(-1), and the increase of the dissolution rate in the standard alkaline developer were achieved. Positive-working resists formulated by the fluororesins were developed and showed fine patterns of 60 nm dense lines and spaces delineated by the exposure at 157 nm wavelength. (C) 2004 American Vacuum Society.