One consequence of the expected shift to low-k1 lithography is the existence of many process fluctuations that make the control of the development processes increasingly important. To control the critical dimension uniformity in the wafer, a low-impact dispensing method for developer was investigated. During the development, the dissolution status is measured as the change of the zeroth order diffracted lights at monitor pattern. This article discusses the best dispense-nozzle-scan condition of a low-impact dispense nozzle and accuracy of the monitor-control-development process that controls according to the change of the zeroth order diffracted lights. (C) 2003 American Vacuum Society.