We have used deposited polymeric nanofibers as nonlithographic templates for the fabrication of semiconductor nanostructures. We deposited oriented poly(methyl methacrylate) (PMMA) fibers, with diameters ranging from 85 to 350 nm, on the surface of various substrates using a microfabricated electrospinning source. By utilizing the small apex of a microfabricated source, a stable Taylor cone was formed as an electrostatically driven source of polymer solution directed toward the substrate. By attaching the target substrate to a rotating counter electrode, isolated and oriented PMMA fibers were deposited. We used these fibers as etch masks to pattern nanostructures in the surface of a silicon wafer. This method provides a simple, nonlithographic approach to forming nanostructures on a wide variety of substrates, such as silicon, aluminum, silicon dioxide, silicon nitride, and glass. The fiber deposition can be oriented with respect to surface features, allowing for realization of nanodevice architectures. (C) 2003 American Vacuum Society.