The irradiation (lambda > 400 nm) in air of a copolymer of phenyl vinyl ketone with 4-vinylbenzil (VBZ) containing 1.5 wt % VBZ structural units in film, followed by the thermal decomposition of the resulting pendant benzoyl peroxide groups, leads to crosslinking. The subsequent irradiation of the crosslinked polymer at 366 nm results in the cleavage of the poly(phenyl vinyl ketone) chain between the junction points of the polymer network through a Norrish type II reaction. Therefore, poly(phenyl vinyl ketone-co-4-vinylbenzil) represents a novel type of photoresist based on polymer network decrosslinking. The process involves three steps: photogeneration of peroxide, crosslinking by its thermal decomposition, and subsequent photodecrosslinking of the polymer network. This material provides positive-tone images after UV exposure (lambda > 330 nm) and development in an organic medium such as isopropyl methyl ketone. (C) 2003 Wiley Periodicals, Inc.