We investigated the chemical transformation of low concentrations (similar to100 ppm) of chlorofluorocarbons (CFCs) in gaseous nitrogen by nonthermal plasma processing by assuming that this transformation occurs by the dominant mechanism of CFC dissociation. The calculated and experimental results indicate that the extent of CFC dissociation induced by energy transfer from electronically excited species is negligible. We suggest that dissociation by impact with high-energy plasma electrons is the process mainly responsible for the decomposition of CFC. We also discuss the possibility of optimizing this plasma process for environmental engineering in the semiconductor industry.