Deposition of fullerene C-60 (2% w/w) on silica and gamma-alumina provokes a two orders-of-magnitude increase of its activity for the liquid-phase photooxidation of 2-methyl-2-heptene. Kinetic studies concerning the above photooxidation showed a first-order dependence of the reaction rate on the alkene concentration. The corresponding reaction-rate constant was found to be higher in the case where gamma-alumina was used as carrier. The nature of the carrier does not influence the mechanism and the selectivity of the reaction. High dispersion of the supported fullerene is achieved on the surface of the carriers, which increase the fullerene light absorbance especially in the visible range.