With the device downsizing dimensions to the nanometer range, current interest in nanotechnology is focused on the state-of-the-art lithographic development. And then, a great number of studies have been made on organized molecular thin films for nanopatterning and fabricating nanostructures using atomic force microscopy (AFM). In spite of the several nano-sized patterning techniques such as photolithography, extreme ultraviolet (EUV) lithography, e-beam lithography and imprint lithography, the nanolithography using AFM has drawn wide attractions in nanotechnology due to unique properties. AFM is used to fabricate patterns and structures in nano scale as well as to obtain topographic images of various surfaces. In this report, we overviewed the recent various nanolithographic techniques based on AFM such as AFM anodization lithography.