Journal of Vacuum Science & Technology A, Vol.21, No.2, 416-421, 2003
Structure and growth of basal and random oriented MoSx coatings deposited by magnetron sputtering
Detailed information on the topography and microstructure of sulfur deficient MoSx coatings deposited by magnetron sputtering at a different argon pressure, is presented. Hereto, a transmission electron microscopy investigation was done on cross sections from the interface between substrate and coating up to the outer part of 1.6 to 3 mum thick coatings. The evolution in structure and crystallographic orientation. across these coatings is presented. In this way, the growth modes of MoSx coatings with different crystallographic orientation are clarified, and the reason's why different crystallographic orientations are obtained, are explained. This clarifies also the wear dependence of some of these coatings on relative humidity. (C) 2003 American Vacuum Society.