Initial stages of Ti adsorption up to coverage of similar to3 monolayers (ML) on the Si (111)-7 x 7 surface at room temperature have been studied by synchrotron-radiation ultraviolet photoemission spectroscopy, scanning tunneling microscopy and low-energy electron diffraction. At very low coverage (less than or equal to0.02 ML) the individual Ti atoms adsorbed on the Si rest atom sites. At higher coverage (similar to0.04 ML) the discrete adatoms are no longer distinct and show a fuzzy appearance indicating the interactions of Ti atoms with Si adatoms. For coverage greater than 0.24 ML, the Si atoms start to mix with the Ti atoms to form an intermixed Ti/Si film and the 7 x 7 reconstruction is destroyed gradually. The reconstruction is removed completely at 1 ML Ti deposition.