The concept of graphoepitaxy is applied to the deposition of cationic polymer micelles (formed from poly(styrene)-block-poly(2-vinylpyridine) in pH1 aqueous solution) from the solution phase onto a Si/SiO2 surface with 100 nm deep ion-etched trenches of variable widths. In all cases, the density and ordering of adsorbed micelles is considerably higher in the 100 nm deep trenches that are between 500 and 5000 nm wide than on the raised areas between the trenches or on a simple planar Si/SiO2.