Structural and magnetic properties of Cu/Ni superlattices are reported. A single bath method under controlled potential was used. Si(100) wafers with thin films of similar to50 nm of evaporated Cu were used as a substrate. The multilayers were plated from a sulfamate solution containing 1.5 mol/L Ni(SO3NH2)(2), 0.01 mol/L CuSO4, 0.5 mol/L H3BO3, at pH 3.5 and 20degreesC. X-ray diffraction and secondary ion mass spectroscopy were used to determine the structure, quality, and chemical composition of the multilayers. Magnetoresistance measurements were carried out using the Van der Pauw structure [Philips Tech. Rev., 22, 220 (1959).] Measurement of the magnetoresistance was made with current flowing in the plane of the multilayer. The applied magnetic field was changed from 0 to +/- 1.5 T. The resulting changes in the resistance were about 2.5%.