In situ patterning of iron oxide thin layers were fabricated via micro-contact printing (mu CP) and selective area deposition. mu CP is used to pattern two different surface moieties of self-assembled organic monolayers (SAMs) on Au/Cr/Si substrates. An elastomeric stamp is used to transfer hydrophobic (hexadecanethiol (HDT)) SAMs that are to sustain deposition of iron oxide precipitates. Hydrophilic (dithiothreitol, DTT) SAMs were used to induce crystalline iron oxide films. 0.05 M of iron nitrate (Fe(NO3)(3). 9H(2)O) aqueous solutions containing urea under nitric acid (pH < 2) were used. Selective depositions were realized through precipitation of crystalline iron oxides at ambient temperature (80 degreesC) onto the mixed SAM surfaces.