화학공학소재연구정보센터
Journal of Vacuum Science & Technology B, Vol.19, No.6, 2347-2352, 2001
Method for reducing hyperbolic phase in interference lithography
A new method is proposed for correcting nonlinear spatial phase in gratings produced with spherical beam interference lithography. We suggest that a concave exposure surface can be used to compensate for the variations in interference angle and fringe inclination which lead to hyperbolic phase progression on a flat exposure plane. Experiments are shown using a spherical concave exposure surface that demonstrate the validity of the method.