Templates for contact printing applications have been fabricated on convex and concave surfaces using electron-beam lithography. Curved quartz lens blanks, coated with a chrome layer to suppress charging, were spincoated with a layer of polymethylmethacrylate (PMMA). Features were patterned into the PMMA followed by development, pattern transfer into the chrome by wet etch, and reactive-ion etching (RIE) of the chrome masked quartz. Features to 0.3 mum have been patterned and transferred similar to 600 nm into the underlying quartz substrate by RIE, with less than a 10% etch depth variation across the sample. The patterned substrate was then used as a template to cast polymer stamps from poly(dimethylsiloxane). This approach provides a convenient method of fabricating curved templates for contact printing. [S0734-211X(00)05206-9].