In scattering with angular limitation in projection electron beam lithography (SCALPEL) mask technology, the choice of membrane material is an important issue from the perspective of mask performance and manufacturing. Low-pressure chemical vapor deposition SiN has been widely employed for SCALPEL membranes because of its excellent manufacturability and other material properties. However, amorphous plasma enhanced chemical. vapor deposition SiC:H has a good potential for the membrane material, and we have developed an optimized process to deposit the SIC films for mask fabrication.