The status of Cat-CVD (Hot Wire CVD) research in the United States is presented. This paper is divided into two topics. Firstly, the status of Si-based Cat-CVD research is presented. For this topic, a short history of previous research in this field is given. This will serve to illustrate the increasing level of interest in this new and exciting field. This part includes both hydrogenated amorphous silicon (a-Si:H) as well as microcrystalline silicon (muc-Si) based materials. Although a heavy emphasis upon basic research will be shown, device work is also included. The second (very brief) topic includes research outside of Si-based materials.