Electrical resistivity measurements in thermally evaporated alpha-Mn thin films have been carried out between 10 and 1.4 K using the van der Pauw four probe technique in magnetic fields up to 9 T. The results reveal a wide variation of the anomalous coefficient of T-2 at low temperatures. This variation is found to be influenced by substrate temperatures. At high substrate temperatures (similar to 300 degrees C) a film whose residual resistivity in the expected range (0.10-0.85 mu Omega m) of bulk alpha-Mn is formed and its anomalously large coefficient of T-2 at low temperatures is found to decrease appreciably with magnetic field. The magnitude of the resistivity at such low temperatures does not change for films coated on substrates held below 200 degrees C in fields up to 9 T. In such films the coefficient of T-2 is negative and the magnitude of the coefficient of T-2, (A) increases with decreasing substrate temperatures.