A pulsed TEA-CO2 laser in combination with the dynamic fluidized bed powder feeder was employed to deposit a thin CeO2 buffer layer on the polycrystalline Ni-substrate in a non-vacuum environment. Use of the 30 degrees powder jet inclination with respect to the laser beam axis along with the nano size precursor powder deposited a smooth layer on the entire surface of the substrate. Both EDS and X-ray diffractometry analyses were employed to confirm the stoichiometric nature of the deposited CeO2 buffer layer.