A mathematical model for the reductive desorption of self-assembled monolayers has been developed. The model is based on the previously presented model in which desorption occurs as growing empty patches, The overlap of patches is described by using the Avrami theorem, and the diffusion rate or the desorbing compound is tal;en into account. The resulting mathematical expression is a nonlinear integral equation with two adjustable parameters. The model is fitted to the experimental results on the desorption of nonanethiol from a self-assembled layer on Au(111). Reasonably good fits are obtained at four desorption potentials.