The effects of temperature on the deposition of vanadium onto the TiO2(110)-(1 x 2) surface have been studied, both by depositing vanadium at an elevated substrate temperature and by annealing vanadium deposited at room temperature to higher temperatures. At higher vanadium coverages and higher temperatures, ordering of the vanadium overlayer occurs; it is attributed to the activated migration of vanadium atoms on the surface. Additionally, both when depositing vanadium at 573 K and when annealing the predeposited layer to 670 K, a "patch" structure is formed on the surface which is attributed to the growth of TiO2(110)-(1 x 1) phase. The appearance of such a phase can be explained by reoxidation, assisted at the lower temperature by the presence of vanadium cations.