Previous Article Next Article Table of Contents Journal of the American Chemical Society, Vol.123, No.22, 5354-5355, 2001 DOI10.1021/ja003952d Export Citation Sensitizing DNA to secondary electron damage: Resonant formation of oxidative radicals from 5-halouracils Abdoul-Carime H, Huels MA, Illenberger E, Sanche L Please enable JavaScript to view the comments powered by Disqus.
