화학공학소재연구정보센터
홈 로그인 로그아웃 연락처 사이트맵
Korean Journal of Chemical Engineering, Vol.18, No.5, 673-678, September, 2001
DOI10.1007/BF02706385  Export Citation
The Effects of Cu-doping in V2O5 Thin Film Cathode for Microbattery
Sang Cheol Nam†, Young Chang Lim, Ho Young Park, Eun Jeong Jeon1, Young Soo Yoon1, Won Il Cho, Byung Won Cho, and Kyung Suk Yun
  • Battery and Fuel Cell Research Center, Korea Institute of Science and Technology, P.O.Box 131,Cheongryang, Seoul 130-650, Korea
  • 1Thin Film Technology Research Center, Korea Institute of Science and Technology, P.O.Box 131,Cheongryang, Seoul 130-650, Korea
E-mail:
Copper-doped vanadium oxide (CuxV2O5) thin film cathode materials for a thin film microbattery have been prepared by DC reactive magnetron co-sputtering with O2/Ar ratio of 10/90 and compared with pure V2O5 thin film. The film structures have been characterized by x-ray diffraction analysis, transmission electron microscopy, Auger electron spectroscopy and X-ray photoelectron spectroscopy. X-ray diffraction and TEM studies show that the Cu(x)V2O5 film was amorphous and phenomenal behavior of copper present in thin film with substrate has been explained by thermodynamical model. Copper doping helps to increase the thickness of the film more than 1 micrometer resulting increase of total capacity. Cycling behavior of the Cu(x)V2O5/Lipon/Li configuration cell system was beyond 500 cycles with average capacity of 50 mAh/cm(2)-μm, which is higher than the pure V2O5 thin film system.
Keywords:Microbattery;Copper-Vanadium Oxide;Lithium Batteries;All-Solid-State;Thin Film Batteries
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