Fe2O3-Cr2O3 artificial passivation films were formed on PI substrates by low pressure metalloganic chemical vapor deposition technique using iron(III) acetylacetonate [Fe(O2C5H7)(3)] and chromium(II) acetylacetonate [Cr(O2C5H7)(3)] aS precursors at substrate temperatures of 150-350 degrees C. Relationships between the crystal structure, and also the chemical state of constituent elements, and the corrosion resistance were examined on the films in acid solutions. The films deposited above 300 degrees C had crystalline structures, and those deposited below 250 degrees C had amorphous structures. The films deposited above 250 degrees C had a high amount of M-O-type chemical bonds, and those deposited below 200 degrees C had a high amount of M-OH-type chemical bonds. The films deposited above 300 degrees C hardly dissolved in 1.0 M HCl and those deposited below 250 degrees C, however, easily dissolved in the solution. The dissolution rate of the films in the solution increased with decreasing substrate temperature. Passive and transpassive current densities of the films in 1.0 M H2SO4 were dependent on the substrate temperature and increased with decreasing the temperature. When polarized cathodically in 1.0 M H2SO4 and 0.5 M HCl, the films deposited below 250 degrees C dissolved due to the reduction of the Fe2O3 component in the films. The reduction of Fe2O3 component was, however, suppressed on the films deposited above 300 degrees C. There fore, with increasing crystallinity and amount of M-O-type chemical bonds, the corrosion resistance of the films increases in HCl and H2SO4 solutions.