We developed a noble carbon nanotube (CNT) deposition method using a layer-by-layer technique, in which the deposition of a thin layer of CNTs and a CF4 plasma exposure on its surface were carried out alternatively. Owing to the difference in the etch rate between amorphous carbon, graphite and CNTs by CF4 plasma, we can selectively etch out some of the unwanted amorphous carbon and graphite phases from the CNTs. In addition, CF4 plasma treatment on the surface can open the ends of the deposited CNTs and results in the increase of emission currents. The new CNTs exhibited a turn-on field of 1.2 V/mum.