Non-classical plasma sputtering of polymers was carried out using a reaction geometry in which the substrate (a supported evaporated gold film) was far (similar to 250 mean free paths) from the polymer target with no line of sight between the two surfaces (the target and substrate faced the same direction). An inductively coupled radio frequency argon plasma of 100 W at 200 mt and a flow rate of 1.8 seem were used. The polymers studied are polyethylene, poly(isobutylene), poly(oxymethylene), poly(tetrahydrofuran), poly(tetrafluoroethylene), poly(chlorotrifluoroethylene), polystyrene, polyq(alpha -methyl styrene), and poly(methyl methacrylate). Substrate-supported polymer films that formed were compared with samples of films prepared by plasma polymerizing monomer gases. Water contact angle, and X-ray photoelectron and infrared spectroscopy were used to characterize the films. Ablation rates of these and similar polymers were studied. factors that influence sputtering behavior are discussed.