화학공학소재연구정보센터
Thin Solid Films, Vol.368, No.1, 49-54, 2000
Deposition and structural characterization of high quality textured C-60 thin films
We present some features of the growth Of C-60 thin films on different substrates at temperatures up to 573 K. The crystalline structure of the films was studied by X-ray diffraction, atomic force microscopy and scanning tunneling microscopy. An effect of selective C60 deposition on an Ag/glass substrate held at 523-573 K is demonstrated. C60 was found to be deposited only on the glass part of the substrate but not on the part of the same substrate which had been predeposited with an Ag or Au layer. The potential use of such selective deposition for micro- and nanoscopic C-60 pattering and fabrication of C-60-based devices is suggested. We report, for the first time, on the possibility of extremely rapid (10-20 Angstrom/s) growth of high quality (111)-textured C-60 films onto Ag and Au substrates held at 523-573 K using a simple vacuum deposition technique. Temperature-resolved XRD experiments revealed that textured C60 films undergo a first order phase transition at 250 K.