TVA thin films are obtained as a result of heated cathode discharge established in vacuum condition in the vapours of the material to be deposited. Anode, a tungsten crucible filled with MgO pellets is bombarded by focused thermoelectrons accelerated toward the anode. Due to the incoming energy, MgO starts to evaporate and a discharge is established in the interelectrode space. This new type of evaporation, ensure high quality films due to the bombardment with energetic ions of the own material growing layer.