Thin Solid Films, Vol.336, No.1-2, 130-136, 1998
Silicon quantum integrated circuits - an attempt to fabricate silicon-based quantum devices using CMOS fabrication techniques
An introduction to the methodology, design concepts, fabrication routes and potential applications is presented of research to fabricate quantum devices on a complementary metal oxide semiconductor (CMOS) fabrication line. Si/Si1-xGex heterostructure field effect transistors, velocity modulation transistors and resonant tunnelling diodes are considered and initial fabrication stages discussed.
Keywords:CHEMICAL-VAPOR-DEPOSITION;FIELD-EFFECT TRANSISTOR;SIGEALLOYS;STRAINED SI;HETEROSTRUCTURES;MOBILITY;OXIDE;GE;TECHNOLOGY;PHYSICS