Carbon nitride films have been formed using a magnetic field filtered plasma stream deposition system. The electrical, optical and mechanical properties of these films deposited at different N-2 partial pressures have been studied. infrared spectra exhibit characteristic bands of carbon nitrogen bonds at 2200, 1500, 1350 cm(-1), showing that the C and N atoms are chemically bonded in the films. X-ray photoelectron spectroscopy has been employed to measure the atomic ratio of N to C in the films. By deconvolution of the XPS spectra, it was identified that the films consist of three phases, namely, beta-C3N4, CNx and ta-C. The relative fractions of these phases in the films were also determined. The optical band gap obtained from optical absorption spectra varies from 3.85 to 4.51 eV depending on the N-2 partial pressure. The measured value of Vickers hardness H-v is between 4000 and 7000 kg/mm(2). The effect of N-2 partial pressure on the properties of these films is also discussed.