A systematic study of the correlated effects of deposition temperature, film thickness and deposition rate on the morphology of gold films on mica was carried out using atomic force microscopy and scanning tunnelling microscopy. For the range of thicknesses, rates and temperatures concerned, a variety of surface structures, mainly in the form of rounded mounds, islands, long channel and short channel plateaux topographical features were formed under various combinations of these three parameters. The rounded mounds and islands formed, respectively, on the mica substrate at room temperature and at 150 degrees C were found to be essentially independent of the film thickness and deposition rate selected. When deposited at higher temperatures (300 degrees C and 440 degrees C, a change from islands to channelled features, via the growth and coalescence of the islands, was observed either on increasing the film thickness for a given deposition rate (similar to 1.0 Angstrom s(-1)) or on increasing the deposition rate to a given film thickness (400 Angstrom). It is evident from the results presented that, whereas the film thickness and the deposition rate at a given temperature determine to what extent the film has coalesced, the growth temperature influences the lateral size of the surface features formed. In consequence, conducting films were found when the gold coverage was greater than or equal to similar to 0.9. Investigation of the vertical characteristics of the films was also conducted. The origin of all the phenomena observed can be attributed to competition between secondary nucleation and thermally enhanced diffusion processes occurring on the gold surface during deposition and film formation.