(Fe,Ti)-N films with a Ti concentration of 10 at.% were prepared on Si(100) and NaCl substrates by facing targets sputtering. The effects of the nitrogen pressure (P-N) and the substrate temperature (T-s) on the formation of various (Fe,Ti)-N phases and their microstructures were investigated in detail. X-ray diffractometer and transmission electron microscope provided complete identification of the phases present in the films and the characterization of their microstructures. Films deposited at a lower P-N = 1 similar to 3 x 10(-2) Pa or a lower T-s = RT consist of mainly alpha-phase. Films deposited at a higher P-N = 1.3 similar to 2 x 10(-1) Pa or a higher T-s = 200 degrees C contain a great many y’ and Fe2N phases with a higher nitrogen content. When P-N = 4 similar to 7 x 10(-2) Pa and T,= 100 similar to 150 degrees C, it is advantageous to the formation of alpha " phase. These films exhibit a high saturation magnetization (M-s) up to the range of 2.3 similar to 2.5 T, which is larger than that of pure iron.