Thin Solid Films, Vol.299, No.1-2, 115-118, 1997
Microstructure Properties of Ba0.5Sr0.5Tio3 Thin-Films on Si with Conductive Srruo3 Bottom Electrodes
Quaternary Ba0.5Sr0.5TiO3 (BSTO) thin films were deposited on (100) Si by pulsed laser deposition with conductive SrRuO3 (SRO) bottom electrodes. The growth of highly (001)-oriented SRO film on (100) Si was accomplished by using a bilayer buffer CeO2 and yttria-stabilized zirconia (YSZ). The BSTO films deposited on SRO on Si using such a buffer system were well aligned in the plane with respect to the major axes of the substrate confirmed by X-ray diffraction. The crystalline nature of the BSTO films on Si was further illustrated by Rutherford backscattering spectrometry and cross-sectional transmission electron microscopy. The BSTO thin films exhibited a dielectric constant above 340 at 10 kHz tested from a capacitor configuration of Au/BSTO/SRO.
Keywords:ELECTRICAL-PROPERTIES;LASER-ABLATION;DIELECTRIC-PROPERTIES;EPITAXIAL-GROWTH;(BA;(BA0.5;SR0.5)TIO3;HETEROSTRUCTURES;DEPOSITION;CONSTANT