Thin Solid Films, Vol.293, No.1-2, 113-116, 1997
Real-Time in-Situ Observation of PVD of N-Vinylcarbazole with FTIR-Ras
N-vinylcarbazole (NVCz) was deposited on the glass substrate, coated with Ag 100 nm thick, at temperatures of 260 K and lower. Realtime in-situ observation of the deposition and the re-evaporation were carried out with Fourier transform infrared reflection absorption spectroscopy. NVCz deposited first as type I in which the angle between the carbazole-ring plane and the substrate surface was 60 degrees. When the thickness reached around 200 nm, the rearrangement from type I to type II having the angle of 69 degrees was induced. After re-evaporation of type I, a type II layer 90 nm thick remained. The heat flow corresponding to the rearrangement which was observed in the deposited film was not observed in a deferential thermal analysis of intrinsic NVCz.
Keywords:REFLECTION-ABSORPTION-SPECTROSCOPY;HYDROGENATED AMORPHOUS-SILICON;VAPOR-DEPOSITION;THIN-FILMS;GROWTH;ELLIPSOMETRY;MONOLAYERS