In this work, we consider the d.c. magnetron sputtering process and we present a Monte Carlo computation of the transport phenomena of the sputtered atoms through the background gas. The atoms are ejected with a cosine or a subcosine (fitted by an elliptical form function) and undergo many collisions with the background gas atoms. The collisions are simulated with an interactive Born-Mayer potential or lead to an aleatory deviation. The model allows one to obtain theoretical thicknesses everywhere on the walls of the chamber. To validate our model we have compared these results with experimental thickness repartitions obtained for sputtering of aluminium, copper and titanium. Our results are in a good agreement with these experimental results. Afterwards, we have used the model to obtain physical values such as energy distribution and mean energy of the impinging atoms. The case of binary alloyed target (aluminium-titanium) sputtering has been considered too. We have calculated the composition of the alloyed coating on the walls of the chamber and the results are compared with experimental values.