Multiscalar multilayer composite films of Ta/W were fabricated using planar magnetron sputtering. Two sets of films were grown to a total thickness of 22 mu m and consisted of two alternating layers : a hard slack composed of 29 layers of 40 Angstrom thick alternating W and Ta layers and a thicker tough layer of pure Ta. The two sets had similar hard stack configurations, but differed in their rough layer thickness (3.5 and 7 mu m). X-Ray diffraction and scanning electron microscopy studies revealed a b.c.c. crystal structure throughout the thickness of each film. The films had a columnar microstructure, with the individual columns showing a [111]-type growth direction and a weak {111} texture in the plane of growth. Hardness values of the order of 480 kgf mm(-2) (4.7 GPa), about four times the values calculated using the rule of mixtures for a chemically similar bulk composite, were measured for the Ta/W films. No microcracks emanating from the hardness indentations were observed, indicating high toughness of these multilayer composites. It was shown in this study that the composite-type approach for providing concomitant strength and toughness in thin films can be applied to more than one material system.