We have developed a compact ion source for ion-assisted film formation. This ion source has two specific features, The first is the ability to feed the discharge gas through a multicapillary nozzle that consists of a few hundred bundled capillaries. Consequently, the gaseous flow becomes intense and collimated. The second feature is producing the plasma by inductive coupled R.F. discharge. Since the R.F. coil is not exposed in the plasma, this ion source can operate with various reactive gases. Moreover, since ions can be extracted into the chamber without extraction grids, the ion energy can be low. It is found that the excited oxygen beam produced by this method includes oxygen ions and atomic oxygen. The flux of excited oxygen species is calculated from the increasing mass of an oxidized silver thin film bombarded by the excited oxygen beam. In the pressure range from 10(-1) to 10(-2) Pa, a flux density of excited oxygen species above 10(16) atoms cm(-2) s(-1) is obtained.