Thin film technology has an increasing demand for industrial reliable characterization techniques. A precise absolute determination of layer thickness, interface width and the quantification of depth profiles in dependence on resolution limits of the measurement are required. Certified reference materials, certified reference coatings (CRCs) and non-destructive evaluation techniques can meet these requirements. Dielectric reference coatings (SiO2, Si3N4) were used for metallographic preparation (e.g. bevelled cross-sections), optical characterization techniques (e.g. spectroscopic ellipsometry (SE)), and films of SiO2, Si3N4 and Al2O3 were applied to reference measurements in depth profiling of layer stacks (e.g. radio frequency glow discharge optical emission spectroscopy). Thickness and refractive index of these dielectric single-and multilayer coatings on different substrate materials are accurately determined in advance by means of SE. These values are subsequently used for precise angle determination of bevelled cross-sections, for reference and re-calibration purposes in thin film characterization (system reproducibility) and in surface analysis (determination of sputter and erosion rates, depth profiles). Examples are discussed for different applications and the calculated data are compared with experimental results. It is shown that reproducible commercial coatings are also of importance for use as CRCs.