Thin Solid Films, Vol.266, No.1, 8-13, 1995
Characterization of a DC Titanium Tetraisopropoxide/H-2/N-2 Plasma Using Emission-Spectroscopy
The analysis of the gaseous phase of a d.c. plasma-assisted chemical vapour deposition plasma operating with a (TiTP)/H-2/N-2 mixture has been performed by optical emission spectroscopy. Highly energetic components of plasma have been identified. A correlation between the emission intensities of excited species in the plasma and cathode temperature and composition of the gaseous mixture has been studied.