Thin Solid Films, Vol.261, No.1-2, 307-310, 1995
Deposition of Thin Polycrystalline Films of Cuprous Thiocyanate on Conducting Glass and Photoelectrochemical Dye-Sensitization
A method is given for electrochemical deposition of thin polycrystalline films of cuprous thiocyanate (p-type semiconductor, band gap = 3.6 eV) on conducting indium-tin oxide glass. Dye-sensitization of the surface with methyl violet and construction of a photoelectrochemical cell are described. The investigation demonstrates the usefulness of unconventional high band gap semiconductors in studying dye-sensitization.