A novel technique, channel-spark pulsed electron (YBCO) beam ablation, was applied to deposit high quality c-axis oriented YBa2Cu3O7-x thin films with T(c0) around 88 K. The apparatus, which is extremely compact, simple and in expensive, is described. The electron beam power density and the efficiency of channel-spark ablation were studied. The effects of the beam and some processing parameters on T(c) of YBCO films fabricated on SrTiO3 (100) substrates are reported.