A-site deficient La(Sr)CrO3-delta thin film interconnectors were successfully fabricated on porous La(Sr)MnOx tubes using high deposition rate laser ablation. The La(Sr)CrO3-delta films obtained by this method are dense and void-free. The film deposition rate was about 10 mu m/min. The substrate could easily be masked in order to deposit the films in the desired shape. The substrate tube was heated at 873-1073 K. As the substrate temperature was much lower than the sintering temperature of the substrate tube, the porous micro-structures of the substrate tube were maintained. The difference in chemical composition between the film and the target was negligible.