An alignment method for obtaining uniform surface stabilized ferroelectric liquid crystal (SSFLC) cell is presented. The uniform alignment is realized by ultrathin (<80 Angstrom) silicon monoxide (SiO) film evaporated at 80 degrees and the treatment of A. C. electric field. The alignment effects of ultrathin SiO film, thick SiO film(> 1000 Angstrom) both evaporated at 80 degrees C and the SiO film evaporated at 60 degrees on the FLC are described. The layer direction of FLC cell with ultrathin SiO film at 80 degrees is perpendicular to that with thick film at the same deposition angle. The advantage of the ultrathin film is that the SSFLC cell aligned by it can be easily treated to perform perfect bistability, excellent contrast and fast switching speed. An possible orientation mechanism on surface of oblique evaporation film is discussed.