wSpatial and transient control of temperature trajectories by a new thermal cycling module is presented, with a focus on photoresist processing applications for semiconductor wafers and quartz reticles. In the proposed unit, the bake and chill steps are conducted sequentially within the same module without any substrate movement. The unit includes two heating sources. The first is a circulating fluid which can be switched between hot and cold reservoirs and serves as the dominant means for heat transfer. The second is a set of thermoelectric devices which are used to provide a distributed amount of heat to the substrate for uniformity and transient temperature control. Experimental data is provided to demonstrate temperature uniformity during both transient and steady state operation. The flexibility of the system to develop new processing temperature trajectories is presented.