화학공학소재연구정보센터
Journal of Vacuum Science & Technology B, Vol.16, No.1, 339-343, 1998
Scanning capacitance microscopy measurement of two-dimensional dopant profiles across junctions
Cross-sectioned p(+)/p and p-n junction test structures were imaged with a scanning capacitance microscope (SCM). To maintain a constant difference capacitance, our SCM utilizes an electronic attenuator circuit with a dynamic range of 20 V to less than 1 mV. Dopant profiles are extracted from SCM images using a formalism, which rapidly determines the theoretical SCM response from a database of calculated C-V curves. A dopant profile from a p(+)/p junction determined via constant difference capacitance SCM is compared to a secondary ion mass spectroscopy profile from similar structures.