We present a survey of neutral atom lithography. The combination of nm-scale features, large-area parallel deposition, and effective resists demonstrates the promise of atoms as a lithographic element. We demonstrate the transfer of 70-nm-wide features from a neutral atomic beam into a substrate using several resists, including self-assembled monolayers of alkanethiolates on Au and of alkylsiloxanes on SiO2, and "contamination" resists deposited from vapor. Unlike photons and electrons? noble gas atoms in energetic metastable states have an internal state structure that is easily manipulable, introducing the possibility of novel lithographic schemes based on the optical quenching of internal energy.