Journal of Vacuum Science & Technology B, Vol.14, No.3, 2362-2365, 1996
Molecular-Beam Epitaxial-Growth and Properties of Short-Wave Infrared Hg0.3Cd0.7Te Films
Hg1-xCdxTe films with cut-off wavelengths ranging from 1.25 to 1.65 mu m (at 300 K) in the short wave infrared band were prepared by molecular beam epitaxy. The structural perfection of the Hg1-xCdxTe films was strongly dependent on the degree of lattice matching provided by the substrate. First reports of in situ p-type doping of Hg1-xCdxTe (x approximate to 0.7) alloys by molecular beam epitaxy is presented here. Electron and hole concentration in excess of 1 x 10(17) cm(-3) were measured in In and As doped films, respectively. Analysis of variable temperature Hall effect data assuming singly ionized impurities provided activation energies of 28.5 meV for As accepters, and 2.95 meV for In donors.
Keywords:HG1-XCDXTE;HGCDTE