Journal of Vacuum Science & Technology B, Vol.13, No.6, 2618-2620, 1995
Lithography by Accelerated Nanoparticle Ions
A nanoparticle lithography process for microstructuring surfaces is realized by eroding an area selectively through impacts of accelerated nanoparticle ions. With singly charged nanoparticles of 1000 carbon dioxide molecules, acceleration by 100 kV Leads to highly supersonic impacts which give rise to shock wave-induced craters in the target. First atomic force microscopy measurements after short-time bombardment are found to be in accordance with predicted crater radii of the order of several 10 nm. Prolonged erosion leads to pronounced smoothing of the eroded surfaces.