Previous Article Next Article Table of Contents Journal of Vacuum Science & Technology B, Vol.13, No.3, 1024-1029, 1995 DOI10.1116/1.587897 Export Citation Effects of TMG/Ash3 Ratio on GaAs Molecular Layer Growth Nishizawa J, Kurabayashi T Keywords:EPITAXY;MOCVD;MECHANISM;SILICON;SURFACE;FILMS Please enable JavaScript to view the comments powered by Disqus.
